Megasonic Cleaning Devices
With ProSys megasonic systems and technology, you can remove particles < 20 nm to > 10 µm, which effectively clean contamination-sensitive products quickly, safely and effectively and improve PRE. It also reduce process cycle time for cleaning and reaction kinetics. It also allow for easy implementation into batch and single-wafer equipment.
MegPie® V4
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Fluid delivery manifold allows up to 100 RPM to eliminate fluid wrap
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RS-232 connectivity for streaming forward power, alarms and warnings
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Sapphire resonator is particle neutral and compatible with process chemistry
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NanoPower™ features front panel input and compact half-rack 2.5U form factor 300mm wafer
Whisper™ MCW Series Controllers
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Single and dual 200mm to 450mm tanks available
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All-quartz wetted surfaces
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Replaceable and repairable transducer arrays
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Thick quartz bottom-mounted transducer
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No cooling DIW required
MegBar™
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Standard and custom lengths available
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Constructed with 316 stainless steel or sapphire
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May be used submerged
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Internal temperature monitoring for reliability
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Energy densities up to 2 Watts/cm2
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Operating temperatures to 60 C
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Repairable
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