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Megasonic Cleaning Devices

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With ProSys megasonic systems and technology, you can remove particles < 20 nm to > 10 µm, which effectively clean contamination-sensitive products quickly, safely and effectively and improve PRE. It also reduce process cycle time for cleaning and reaction kinetics. It also allow for easy implementation into batch and single-wafer equipment.

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Got a product that suits your needs?

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18 Sin Ming Lane, #05-01 Midview City, Singapore 573960

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Tel: +65 6459 5962

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